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Magnetron Ion Sputtering Coating Instrument
Magnetron Ion Sputtering Coating Instrument
Overview
Technical Specifications
Product Advantages
Product Applications
Product Overview
The Magnetron Ion Sputtering Coater is designed for high-quality metal film deposition using magnetron sputtering technology. It enables uniform coating of metals on sample surfaces and is widely used in materials science, electron microscopy sample preparation, and semiconductor processing.
Technical Specifications
| Specification | Details |
| Vacuum System | Rotary mechanical pump (high power) |
| Ultimate Vacuum | 2 Pa |
| Pumping Speed | 50Hz: 8 m³/h; 60Hz: 9.6 m³/h |
| Sputtering Current | Max 100 mA |
| Sputtering Pressure | 20 Pa – 8 Pa |
| Vacuum Time | |
| Vacuum Gauge | Digital gauge, range 2×10³ mbar |
| Coating Materials | Nickel, Gold, Silver, Platinum |
| Film Thickness | 50 - 120 nm (thickness gauge required) |
| Sample Size | Diameter ≤ 50 ± 0.1 mm (single layer) |
| Sample Quantity | 1 piece |
| Power Supply | AC 220V / 50Hz |
| Power Consumption | |
| Cooling Method | Water cooling (optional) |
| Dimensions | 360 × 300 × 380 mm |
| Weight | 45 kg |
Product Advantages
Magnetron sputtering for stable and uniform coating
Compatible with various metal materials
Easy operation for research and teaching use
Fast vacuum pumping for efficient workflow
Compact design suitable for limited lab space
Optional water cooling for enhanced stability
Product Applications
Materials research and surface treatment
Electron microscopy sample preparation
Semiconductor device fabrication
Metal film electrode production
Laboratory teaching and research in universities
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As a high-tech company "driven by technology and anchored in service," we have placed great emphasis on our technical expertise and R&D capabilities since our inception.
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